发明公开
EP1975718A3 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
审中-公开
表面处理剂和结构形成和结构形成工艺与所述表面处理剂
- 专利标题： Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
- 专利标题（中）： 表面处理剂和结构形成和结构形成工艺与所述表面处理剂
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申请号： EP08005508.0申请日： 2008-03-25
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公开(公告)号： EP1975718A3公开(公告)日： 2013-12-11
- 发明人: Hoshino, Wataru , Tsubaki, Hideaki , Yoshidome, Masahiro
- 申请人： FUJIFILM Corporation
- 申请人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo JP
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo JP
- 代理机构： HOFFMANN EITLE
- 优先权： JP2007079306 20070326; JP2007311180 20071130
- 主分类号： G03F7/11
- IPC分类号： G03F7/11 ; G03F7/20 ; G03F7/00 ; G03F7/40
摘要：
A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent.
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