发明公开
EP2005254A4 MANUFACTURING DEVICES USING A DONEE LAYER CLEAVED FROM A CRYSTALLINE DONOR
审中-公开
生产设备采用一项的结晶供体的分裂出接收层
- 专利标题: MANUFACTURING DEVICES USING A DONEE LAYER CLEAVED FROM A CRYSTALLINE DONOR
- 专利标题(中): 生产设备采用一项的结晶供体的分裂出接收层
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申请号: EP07760030申请日: 2007-04-03
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公开(公告)号: EP2005254A4公开(公告)日: 2014-07-16
- 发明人: JAIN AJAYKUMAR R
- 申请人: VERSATILIS LLC
- 专利权人: VERSATILIS LLC
- 当前专利权人: VERSATILIS LLC
- 优先权: US40066806 2006-04-07
- 主分类号: G03G7/00
- IPC分类号: G03G7/00 ; H01L21/18 ; H01L21/683 ; H01L21/762 ; H01L27/12 ; H01L29/786 ; H01L33/00 ; H01S5/02
摘要:
Various embodiments of fabricated crystalline-based structures for the electronics, optoelectronics and optics industries are disclosed. Each of these structures is created in part by cleaving a donee layer from a crystalline donor, such as a micaceous/lamellar mass comprising a plurality of lamelliform sheets separable from each other along relatively weak cleavage planes. Once cleaved, one or more of these lamelliform sheets become the donee layer. The donee layer may be used for a variety of purposes, including a crystalline layer for supporting heteroepitaxial growth of one or more semiconductor layers thereon, an insulating layer, a barrier layer, a planarizing layer and a platform for creating useful structures, among others.
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