发明授权
- 专利标题： A METHOD OF FABRICATING A NANOSTRUCTURE ON A PRE-ETCHED SUBSTRATE.
- 专利标题（中）： 制造方法性纳米结构上的预蚀刻的衬底
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申请号： EP07825248.3申请日： 2007-06-26
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公开(公告)号： EP2047509B1公开(公告)日： 2012-04-11
- 发明人: EBELS, Ursula , DIENY, Bernard , LESTELLE, Dominique , GAUTIER, Eric
- 申请人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 申请人地址： Bâtiment "Le Ponant D" 25, rue Leblanc 75015 Paris FR
- 专利权人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 当前专利权人： Commissariat à l'Énergie Atomique et aux Énergies Alternatives
- 当前专利权人地址： Bâtiment "Le Ponant D" 25, rue Leblanc 75015 Paris FR
- 代理机构： Bolinches, Michel Jean-Marie
- 优先权： FR0606907 20060727
- 国际公布： WO2008012684 20080131
- 主分类号： H01L23/528
- IPC分类号： H01L23/528
摘要：
The present invention relates to a method of fabricating a nanostructure, comprising the following steps: prestructuring a substrate (1) adapted to receive the nanostructure to form a nanorelief (2) on the substrate, the nanorelief having flanks (4) extending from a bottom (1a) of the substrate and a top face (3) extending from said flanks, and then depositing on the substrate prestructured in this way a single layer or multilayer coating intended to form the nanostructure; and further comprising: adding to the prestructured substrate or to the coating a separation layer adapted to enable separation of the coating and the substrate by external action of mechanical, thermomechanical or vibratory type; and exerting this external action on the substrate and/or the coating to recover selectively a top portion of the coating by separating it from the top face of the nanorelief so that this top portion constitutes some or all of the nanostructure.
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