发明授权
- 专利标题： METHOD FOR PRODUCING NANOPARTICLES BY FORCED ULTRA-THIN FILM ROTARY PROCESSING
- 专利标题（中）： 用超薄膜旋转加工生产纳米颗粒的方法
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申请号： EP08790916.4申请日： 2008-07-04
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公开(公告)号： EP2184109B1公开(公告)日： 2017-08-23
- 发明人: ENOMURA, Masakazu
- 申请人： M Technique Co., Ltd.
- 申请人地址： 2-16, Technostage 2-chome Izumi-shi Osaka 594-1144 JP
- 专利权人： M Technique Co., Ltd.
- 当前专利权人： M Technique Co., Ltd.
- 当前专利权人地址： 2-16, Technostage 2-chome Izumi-shi Osaka 594-1144 JP
- 代理机构： Maury, Richard Philip
- 优先权： JP2007179098 20070706; JP2007179099 20070706; JP2007179103 20070706; JP2007179102 20070706; JP2007179100 20070706; JP2007179101 20070706; JP2007179104 20070706; JP2007180349 20070709; JP2007203850 20070806; JP2007207426 20070809; JP2007214821 20070821; JP2007233557 20070910
- 国际公布： WO2009008393 20090115
- 主分类号： B02C7/14
- IPC分类号： B02C7/14 ; B01J19/00 ; B41J2/01 ; B41M5/00 ; C09B67/02 ; C09B67/10 ; C09B67/20 ; B01F7/00 ; C09B67/00
摘要：
The present invention provides a method for producing nanoparticles, which comprises maintaining a minute space of 1 mm or less between two processing surfaces capable of approaching to and separating from each other and being rotating relative to each other, allowing the minute space maintained between the two processing surfaces to serve as a flow path of a processed fluid thereby forming a forced thin film of the processed fluid and separating nanoparticles in the forced thin film.
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