发明公开
EP2202008A1 METHOD FOR CLEANING HEAT MODE TYPE RECORDING MEDIUM LAYER, METHOD FOR MANUFACTURING PRODUCT HAVING RECESS AND PROJECTION, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
审中-公开
清理方法一热模式记录介质层，一种用于生产产品配水井和投影，从而产生发光用于生产光学元件的元件和方法的方法
- 专利标题： METHOD FOR CLEANING HEAT MODE TYPE RECORDING MEDIUM LAYER, METHOD FOR MANUFACTURING PRODUCT HAVING RECESS AND PROJECTION, METHOD FOR MANUFACTURING LIGHT EMITTING ELEMENT AND METHOD FOR MANUFACTURING OPTICAL ELEMENT
- 专利标题（中）： 清理方法一热模式记录介质层，一种用于生产产品配水井和投影，从而产生发光用于生产光学元件的元件和方法的方法
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申请号： EP08838953.1申请日： 2008-10-07
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公开(公告)号： EP2202008A1公开(公告)日： 2010-06-30
- 发明人: USAMI, Yoshihisa
- 申请人： Fujifilm Corporation
- 申请人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo 106-8620 JP
- 专利权人： Fujifilm Corporation
- 当前专利权人： Fujifilm Corporation
- 当前专利权人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo 106-8620 JP
- 代理机构： Klunker . Schmitt-Nilson . Hirsch
- 优先权： JP2007267664 20071015
- 国际公布： WO2009050858 20090423
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; B08B3/04
摘要：
A method for cleaning a heat mode type recording material layer to remove debris (D) generated when a plurality of recessed portions (15) are formed in a thermally deformable heat mode recording material layer (12) by application of condensed light is provided, which method includes using a liquid (L) inactive to the recording material layer (12), to thereby remove the debris (D). This method for cleaning a heat mode type recording material layer is applicable to a method for manufacturing a pit-projection product, a method for manufacturing a light emitting element, and a method for manufacturing an optical element.
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