发明公开
- 专利标题: Pellicle frame and lithographic pellicle
- 专利标题(中): 薄膜框架和光刻薄膜
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申请号: EP10167075.0申请日: 2010-06-23
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公开(公告)号: EP2267528A3公开(公告)日: 2013-04-03
- 发明人: Shirasaki, Toru , Mushell, David , Chakravorty, Kishore , Ng, Grace
- 申请人: Shin-Etsu Chemical Co., Ltd. , Intel Corporation (INTEL)
- 申请人地址: 6-2 Ohtemachi 2-chome Chiyoda-ku Tokyo JP
- 专利权人: Shin-Etsu Chemical Co., Ltd.,Intel Corporation (INTEL)
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.,Intel Corporation (INTEL)
- 当前专利权人地址: 6-2 Ohtemachi 2-chome Chiyoda-ku Tokyo JP
- 代理机构: Vossius & Partner
- 优先权: JP2009149775 20090624
- 主分类号: G03F1/64
- IPC分类号: G03F1/64
摘要:
A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm 2 . There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.
公开/授权文献
- EP2267528B1 Pellicle frame and lithographic pellicle 公开/授权日:2020-07-08
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