发明公开
EP2270598A1 LASER EXPOSURE METHOD, PHOTORESIST LAYER WORKING METHOD, AND PATTERN MOLDING MANUFACTURING METHOD
审中-公开
激光焊接机，FOTOLACKSCHICHTBEARBEITUNGSVERFAHREN UND VERFAHREN ZUR HERSTELLUNG EINER STRUKTURFORM
- 专利标题： LASER EXPOSURE METHOD, PHOTORESIST LAYER WORKING METHOD, AND PATTERN MOLDING MANUFACTURING METHOD
- 专利标题（中）： 激光焊接机，FOTOLACKSCHICHTBEARBEITUNGSVERFAHREN UND VERFAHREN ZUR HERSTELLUNG EINER STRUKTURFORM
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申请号： EP09734419.6申请日： 2009-03-23
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公开(公告)号： EP2270598A1公开(公告)日： 2011-01-05
- 发明人: USAMI, Yoshihisa
- 申请人： FUJIFILM Corporation
- 申请人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo 106-8620 JP
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： 26-30, Nishiazabu 2-chome Minato-ku Tokyo 106-8620 JP
- 代理机构： Klunker . Schmitt-Nilson . Hirsch
- 优先权： JP2008111737 20080422; JP2009032581 20090216
- 国际公布： WO2009130846 20091029
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01L21/027
摘要：
A laser exposure method for performing exposure is provided in which a supporting stage (2) supporting a plurality of objects (workpieces 5) and a laser beam illumination device (3) illuminating the objects while a focus servo control based on reflected light is being effected are moved relative to each other. The method includes a control start step of starting the focus servo control when the laser beam has reached a focus start position (FS) on an object; a control stop step of stopping the focus servo control when the laser beam has reached a focus stop position (FE) on the object; and a retaining step of retaining a position of an optical component (objective lens 35) at a predetermined position for a period until the laser beam starting from the focus stop position (FE) on the object reaches a focus start position (FS) on a subsequent object.
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