发明公开
EP2272115A1 SUBSTRATE, RADIATION SOURCE, PHOTOCELL AND PRODUCTION METHODS
审中-公开
基质，辐射源PHOTOCELL及其制造方法
- 专利标题： SUBSTRATE, RADIATION SOURCE, PHOTOCELL AND PRODUCTION METHODS
- 专利标题（中）： 基质，辐射源PHOTOCELL及其制造方法
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申请号： EP09737780.8申请日： 2009-03-28
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公开(公告)号： EP2272115A1公开(公告)日： 2011-01-12
- 发明人: MELCHER, Martin , TCHAKAROV, Svetoslav
- 申请人： Saint-Gobain Glass France
- 申请人地址： 39 Quai Lucien Lefranc 93300 Aubervilliers FR
- 专利权人： Saint-Gobain Glass France
- 当前专利权人： Saint-Gobain Glass France
- 当前专利权人地址： 39 Quai Lucien Lefranc 93300 Aubervilliers FR
- 代理机构： Lendvai, Tomas
- 优先权： DE102008021655 20080430
- 国际公布： WO2009132736 20091105
- 主分类号： H01L51/52
- IPC分类号： H01L51/52 ; H01L51/44
摘要：
The invention relates to a substrate comprising a conductive mesh of metallic conductor traces (102) deposited on the substrate, wherein the conductor traces have a first side (104), facing the substrate, and a second side (106), remote from the substrate, wherein the second side is at least partly provided with a reflective layer (110) and wherein the substrate is transmissive.
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