发明授权
- 专利标题： VERFAHREN UND ANORDNUNG ZUR ERZEUGUNG VON AZIMUTALER POLARISATION IN EINER LASERLICHTQUELLE UND VERWENDUNG DIESER ANORDNUNG ZUR LASERMATERIALBEARBEITUNG
- 专利标题（英）： Method and apparatus for producing azimuthal polarization in a laser light source and use of said apparatus for laser material processing
- 专利标题（中）： 方法及系统的激光光源，并使用此安排来生成方位极化激光材料加工
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申请号： EP09804638.6申请日： 2009-08-06
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公开(公告)号： EP2311159B1公开(公告)日： 2012-02-01
- 发明人: STEFFEN, Jürg , WITTWER, Stefan , REBER, Thomas
- 申请人： Bystronic Laser AG
- 申请人地址： Industriestrasse 21 3362 Niederönz CH
- 专利权人： Bystronic Laser AG
- 当前专利权人： Bystronic Laser AG
- 当前专利权人地址： Industriestrasse 21 3362 Niederönz CH
- 代理机构： Patentbüro Paul Rosenich AG
- 优先权： CH12442008 20080808
- 国际公布： WO2010016028 20100211
- 主分类号： H01S3/081
- IPC分类号： H01S3/081 ; B23K26/38
摘要：
The invention relates to a laser (1) comprising a laser beam path for a laser beam, a fraction of which is in a state of azimuthal polarization, in a laser resonator, wherein the laser beam path comprises a beam-focusing optical component (4) that spreads the beam by a spreading angle between two optical components (2, 3), said optical component comprising mirror surfaces at which the light that is aimed by the beam spreading optical components at said mirror surfaces during operation of the laser is received and reflected at an angle at or near the Brewster angle, wherein the fraction of azimuthal polarization condition is maximized through the selective minimization of losses thereof during reflection.
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