发明公开
EP2336216A1 Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
审中-公开
Derivatisierte Polyhydroxystyrole mit einer Struktur vom Novolaktyp und Herstellungsverfahrendafür
- 专利标题: Derivatized polyhydroxystyrenes with a novolak type structure and processes for preparing the same
- 专利标题(中): Derivatisierte Polyhydroxystyrole mit einer Struktur vom Novolaktyp und Herstellungsverfahrendafür
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申请号: EP10179873.4申请日: 2005-04-22
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公开(公告)号: EP2336216A1公开(公告)日: 2011-06-22
- 发明人: SHEEHAN, Michael T. , ZEY, Edward G.
- 申请人: DuPont Electronic Polymers L.P.
- 申请人地址: 14785 Preston Road, Suite 480 Dallas, TX 75254 US
- 专利权人: DuPont Electronic Polymers L.P.
- 当前专利权人: DuPont Electronic Polymers L.P.
- 当前专利权人地址: 14785 Preston Road, Suite 480 Dallas, TX 75254 US
- 代理机构: Warner, James Alexander
- 优先权: US567934P 20040505
- 主分类号: C08G61/02
- IPC分类号: C08G61/02 ; C09D125/18
摘要:
A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer. New compositions of matter which comprise the derivatized poly(4-hydroxystyrene) prepared in the above manner and which have application in the electronic chemicals market such as in a photoresist composition, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, and the like.
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