发明公开
- 专利标题: PROBE FOR IMPLANTABLE ELECTRO-STIMULATION DEVICE
- 专利标题(中): 探头可植入设备的电刺激
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申请号: EP09787375.6申请日: 2009-10-07
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公开(公告)号: EP2341979A1公开(公告)日: 2011-07-13
- 发明人: WANG, Ke , MARTENS, Hubert, C., F. , BUDZELAAR, Franciscus, P., M. , HARBERTS, Dirk, W. , DECRE, Michel, M., J. , TOL, Jeroen, J., A.
- 申请人: Koninklijke Philips Electronics N.V.
- 申请人地址: Groenewoudseweg 1 5621 BA Eindhoven NL
- 专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人地址: Groenewoudseweg 1 5621 BA Eindhoven NL
- 代理机构: Kroeze, Johannes Antonius
- 优先权: EP08166665 20081015
- 国际公布: WO2010044015 20100422
- 主分类号: A61N1/05
- IPC分类号: A61N1/05 ; A61N1/08
摘要:
The invention relates to a probe for an implantable electro-stimulation device. The probe (20) has a distal end (12) and a proximal end (13), and moreover comprises: one or more electrodes (11) a shield (21) of conducting material covering a major part of the probe, said shield extending from the vicinity of at least one of the one or more electrodes (11) towards the proximal end (13) or towards the distal end (12) of the probe (20); and a layer (22a, 22b) of insulating material covering part of the shield (21) in the vicinity of the at least one of the one or more electrodes. The shield protects wires (14), extending from electrodes to the proximal end of the probe, from undesired interference of external RF fields. The exposed part of the shield not covered by the layer of insulating material serves as a return electrode for the electrostimulation signal path.
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