发明公开
- 专利标题: Insulated light-reflective substrate
- 专利标题(中): 。。。。。。。。。
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申请号: EP11164058.7申请日: 2011-04-28
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公开(公告)号: EP2384100A2公开(公告)日: 2011-11-02
- 发明人: Hotta, Yoshinori , Hatanaka, Yusuke
- 申请人: Fujifilm Corporation
- 申请人地址: 26-30 Nishiazabu 2-chome Minato-ku Tokyo JP
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: 26-30 Nishiazabu 2-chome Minato-ku Tokyo JP
- 代理机构: HOFFMANN EITLE
- 优先权: JP2010104527 20100428; JP2010150442 20100630; JP2010291243 20101227
- 主分类号: H05K1/05
- IPC分类号: H05K1/05 ; C25D11/12 ; C25D11/16 ; H01L33/64 ; H01L33/60
摘要:
An insulated light-reflective substrate, comprising a substrate and an anodized film provided on the surface of the substrate, wherein: the substrate has at its surface an aluminum alloy layer of a thickness of not less than 10 µm; the aluminum alloy layer has an aluminum purity of 99.9% by weight or higher, with the total content of Si and Fe in the layer being not more than 0.005% by weight, and the content of inevitable impurities in the layer as components other than Al, Si, Fe, Ga and Zn being not more than 0.01% by weight; the anodized film has micropores each extending from the surface of the film in the direction of thickness; and the ratio of center line length to depth of the micropores is 1.0 to 1.2.
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