发明公开
EP2453309A3 Compositions comprising sugar component and processes for photolithography
审中-公开
具有糖组分的组合物，以及用于光刻法
- 专利标题： Compositions comprising sugar component and processes for photolithography
- 专利标题（中）： 具有糖组分的组合物，以及用于光刻法
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申请号： EP11189109.9申请日： 2011-11-15
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公开(公告)号： EP2453309A3公开(公告)日： 2012-09-19
- 发明人: Oh, Joon Seok , Wang, Deyan , Liu, Cong , Li, Mingqi , Wu, Chunyi , Xu, Cheng-Bai
- 申请人： Rohm and Haas Electronic Materials LLC
- 申请人地址： 455 Forest Street Marlborough, MA 01752 US
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： 455 Forest Street Marlborough, MA 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US413825P 20101115
- 主分类号： G03F7/038
- IPC分类号： G03F7/038 ; G03F7/039 ; G03F7/20
摘要：
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
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