发明公开
- 专利标题： Coating compositions for use with an overcoated photoresist
- 专利标题（中）： 与外涂光刻胶一起使用的涂料组合物
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申请号： EP11195283.4申请日： 2011-12-22
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公开(公告)号： EP2472329A1公开(公告)日： 2012-07-04
- 发明人: Ongayi, Owendi , Jain, Vipul , Coley, Suzanne , Zampini, Anthony
- 申请人： Rohm and Haas Electronic Materials LLC
- 申请人地址： 455 Forest Street Marlborough, MA 01752 US
- 专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人： Rohm and Haas Electronic Materials LLC
- 当前专利权人地址： 455 Forest Street Marlborough, MA 01752 US
- 代理机构： Buckley, Guy Julian
- 优先权： US201061428896P 20101231
- 主分类号： G03F7/09
- IPC分类号： G03F7/09 ; G03F7/11
摘要：
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more uracil moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
公开/授权文献
- EP2472329B1 Coating compositions for use with an overcoated photoresist 公开/授权日：2013-06-05
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