发明公开
- 专利标题： PROCESS FOR PRODUCTION OF POLYAMIDEIMIDE RESIN MICROPARTICLES, AND POLYAMIDEIMIDE RESIN MICROPARTICLES
- 专利标题（中）： 用于生产聚酰胺酰亚胺微粒和聚酰胺酰亚胺微粒
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申请号： EP10831403.0申请日： 2010-10-06
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公开(公告)号： EP2502952A1公开(公告)日： 2012-09-26
- 发明人: AKASAKA, Hiroaki , ONO, Takae , TAKAHASHI, Toshiya
- 申请人： Toray Industries, Inc.
- 申请人地址： 1-1, Nihonbashi-Muromachi 2-chome Chuo-ku Tokyo, 103-8666 JP
- 专利权人： Toray Industries, Inc.
- 当前专利权人： Toray Industries, Inc.
- 当前专利权人地址： 1-1, Nihonbashi-Muromachi 2-chome Chuo-ku Tokyo, 103-8666 JP
- 代理机构： Prüfer & Partner GbR European Patent Attorneys
- 优先权： JP2009264007 20091119
- 国际公布： WO2011062006 20110526
- 主分类号： C08J3/14
- IPC分类号： C08J3/14 ; C08G73/14
摘要：
The present invention provides a process to produce fine particles of polyamide-imide resin that can be carried out industrially by simple operations with a high reproducibility. It also provides very fine PAI resin particles with a uniform particle size. The invention provides a production process for fine PAI resin particles comprising a dissolution steps and a precipitation step as described below:
[Dissolution step] A step selected from the undermentioned steps (a1) and (b1)
(a1) PAI resin is dissolved in an organic solvent to prepare a PAI resin solution A1 having a PAI resin content of less than 5 mass%,
(b1) PAI resin is dissolved in an organic solvent to prepare a PAI resin solution B1 having a PAI resin content of less than 10 mass%.
[Precipitation step]
(a2) The PAI resin solution A1 is added to a solvent that is virtually free from surface active agents and able to precipitate fine PAI resin particles, in order to cause the precipitation of fine PAI resin particles,
(b2) The PAI resin solution B1 is subjected to flash crystallization to cause the precipitation of fine PAI resin particles.
[Dissolution step] A step selected from the undermentioned steps (a1) and (b1)
(a1) PAI resin is dissolved in an organic solvent to prepare a PAI resin solution A1 having a PAI resin content of less than 5 mass%,
(b1) PAI resin is dissolved in an organic solvent to prepare a PAI resin solution B1 having a PAI resin content of less than 10 mass%.
[Precipitation step]
(a2) The PAI resin solution A1 is added to a solvent that is virtually free from surface active agents and able to precipitate fine PAI resin particles, in order to cause the precipitation of fine PAI resin particles,
(b2) The PAI resin solution B1 is subjected to flash crystallization to cause the precipitation of fine PAI resin particles.
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