Methods and structures are disclosed to minimize the presence of vapor clouding in the path between an energy (e.g., radiation) source (16) and the dampening fluid layer in a variable data lithography system. Also disclosed are conditions for optimizing vaporization of regions of the dampening fluid layer for a given laser source power. Conditions are also disclosed for minimizing recondensation of vaporized dampening fluid onto the patterned dampening fluid layer. Accordingly, a reduction in the power required for, and an increase in the reproducibility of, patterning of a dampening fluid layer over a reimageable surface (12) in a variable data lithography system are disclosed.