发明公开
EP2576501A1 AROMATIC AMIC ACID SALTS AND COMPOSITIONS
审中-公开
AROMATISCHEAMIDSÄURESALZEUND ZUSAMMENSETZUNGEN
- 专利标题： AROMATIC AMIC ACID SALTS AND COMPOSITIONS
- 专利标题（中）： AROMATISCHEAMIDSÄURESALZEUND ZUSAMMENSETZUNGEN
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申请号： EP11722678.7申请日： 2011-05-17
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公开(公告)号： EP2576501A1公开(公告)日： 2013-04-10
- 发明人: SHUKLA, Deepak , MEYER, Dianne, M. , AHEARN, Wendy, Gail
- 申请人： Eastman Kodak Company
- 申请人地址： 343 State Street Rochester, New York 14650-2201 US
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： 343 State Street Rochester, New York 14650-2201 US
- 代理机构： Wibbelmann, Jobst
- 优先权： US788347 20100527
- 国际公布： WO2011149699 20111201
- 主分类号： C07C233/57
- IPC分类号： C07C233/57 ; C07C233/59 ; H01L51/00 ; C07C211/62 ; C07C211/63
摘要：
Aromatic non-polymeric amic acid salts are designed to be thermally converted into corresponding arylene diimides. These aromatic, non-polymeric amic acid salts can be used to prepare semiconducting thin films that can be used in various articles including thin-film transistor devices that can be incorporated into a variety of electronic devices. In this manner, the arylene diimide need not be coated but is generated
in situ from a solvent-soluble, easily coated aromatic, non-polymeric amic acid salt at relatively lower temperature because the cation portion of the amic acid salt acts as an internal catalyst.
in situ from a solvent-soluble, easily coated aromatic, non-polymeric amic acid salt at relatively lower temperature because the cation portion of the amic acid salt acts as an internal catalyst.
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