发明公开
- 专利标题: REGISTRATION OF AN EXTENDED REFERENCE FOR PARAMETER MEASUREMENT IN AN OPTICAL SENSING SYSTEM
- 专利标题(中): 扩展的参考参数测量在光学检测系统注册
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申请号: EP11790271.8申请日: 2011-05-31
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公开(公告)号: EP2577222A2公开(公告)日: 2013-04-10
- 发明人: FROGGATT, Mark, E. , KLEIN, Justin, W. , GIFFORD, Dawn, K. , REAVES, Matthew , BOS, Joseph, J. , SANG, Alexander, K.
- 申请人: Luna Innovations Incorporated
- 申请人地址: 1 Riverside Circle, Suite 400 Roanoke, VA 24016 US
- 专利权人: Luna Innovations Incorporated
- 当前专利权人: Luna Innovations Incorporated
- 当前专利权人地址: 1 Riverside Circle, Suite 400 Roanoke, VA 24016 US
- 代理机构: Frontoni, Stefano
- 优先权: US350343P 20100601; US201161434175P 20110119
- 国际公布: WO2011153126 20111208
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01N21/47
摘要:
An interferometric measurement system measures a parameter using at least one optical waveguide. A memory stores reference interferometric pattern data associated with a segment of the optical waveguide. Interferometric detection circuitry detects and stores measurement interferometric pattern data associated with the segment of the optical waveguide during a measurement operation. A spectral range of the reference interferometric pattern of the optical waveguide is greater than a spectral range of the measurement interferometric pattern of the optical waveguide. A processor shifts one or both of the measurement interferometric pattern data and the reference interferometric pattern data relative to the other to obtain a match and to use the match to measure the parameter. An example parameter is strain.
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