To provide a process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film having a low light reflectance and a high light transmittance, with good production efficiency, with which a silicon oxide film having functions derived from the inorganic fine particles imparted can be directly formed on a glass substrate or a glass ribbon at high temperature.
(1) A process for producing a glass substrate provided with an inorganic fine particle-containing silicon oxide film, which comprises applying a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500°C and inorganic fine particles to a glass substrate within a temperature range of from 400 to 650°C to form an inorganic fine particle-containing silicon oxide film on the glass substrate, or (2) a process for producing a glass substrate, comprising forming molten glass into a glass ribbon, annealing the glass ribbon and cutting it to produce a glass substrate, wherein a coating liquid containing an organopolysiloxane having an exothermic peak temperature of at most 500°C and inorganic fine particles is applied to the glass ribbon at a position where the glass ribbon is within a temperature range of from 400 to 650°C to form an inorganic fine particle-containing silicon oxide film on the glass ribbon.