发明公开
EP2618360A1 Target for X-ray generation, X-ray generator, and method for producing target for X-ray generation
有权
目标zurRöntgenstrahlerzeugung，Röntgenstrahlgenerator和Verfahren zur Herstellung eines solchen目标
- 专利标题： Target for X-ray generation, X-ray generator, and method for producing target for X-ray generation
- 专利标题（中）： 目标zurRöntgenstrahlerzeugung，Röntgenstrahlgenerator和Verfahren zur Herstellung eines solchen目标
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申请号： EP13002045.6申请日： 2010-09-01
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公开(公告)号： EP2618360A1公开(公告)日： 2013-07-24
- 发明人: Suyama, Motohiro , Ishii, Atsushi , Kiyomoto, Tomofumi , Kadosawa, Katsuji , Okumura, Katsuya
- 申请人： Tokyo Electron Limited , Hamamatsu Photonics K.K.
- 申请人地址： 3-1 Akasaka 5-chome Minato-ku Tokyo 107-6325 JP
- 专利权人： Tokyo Electron Limited,Hamamatsu Photonics K.K.
- 当前专利权人： Tokyo Electron Limited,Hamamatsu Photonics K.K.
- 当前专利权人地址： 3-1 Akasaka 5-chome Minato-ku Tokyo 107-6325 JP
- 代理机构： Grünecker, Kinkeldey, Stockmair & Schwanhäusser
- 优先权： JP2009204891 20090904
- 主分类号： H01J35/12
- IPC分类号： H01J35/12
摘要：
A target for X-ray generation has a substrate (1) and a target portion (10). The substrate is comprised of diamond and has a first principal surface (1a) and a second principal surface (1b) opposed to each other. A bottomed hole (3) is formed from the first principal surface side in the substrate. The target portion is comprised of a metal deposited from a bottom surface (3a) of the hole toward the first principal surface. An entire side surface (10c) of the target portion is in close contact with an inside surface (3b) of the hole. A protecting layer (13) protecting the substrate from the electron beam is formed on the first principal surface.
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