发明公开
EP2647686A3 Resin Composition And Semiconductor Device Produced By Using The Same
审中-公开
树脂组合物和由此制得的半导体器件
- 专利标题: Resin Composition And Semiconductor Device Produced By Using The Same
- 专利标题(中): 树脂组合物和由此制得的半导体器件
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申请号: EP13165702.5申请日: 2005-03-16
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公开(公告)号: EP2647686A3公开(公告)日: 2013-10-30
- 发明人: Okubo, Hikaru , Tanaka, Nobuki , Watanabe, Itaru
- 申请人: SUMITOMO BAKELITE CO., LTD.
- 申请人地址: 5-8, Higashi-Shinagawa 2-chome, Shinagawa-ku Tokyo 140-0002 JP
- 专利权人: SUMITOMO BAKELITE CO., LTD.
- 当前专利权人: SUMITOMO BAKELITE CO., LTD.
- 当前专利权人地址: 5-8, Higashi-Shinagawa 2-chome, Shinagawa-ku Tokyo 140-0002 JP
- 代理机构: Müller, Christian Stefan Gerd
- 优先权: JP2004080921 20040319; JP2004083936 20040323; JP2004085885 20040324; JP2004371083 20041222; JP2004377430 20041227
- 主分类号: C09J201/02
- IPC分类号: C09J201/02 ; C08F290/06 ; H01L21/52 ; C08G73/12 ; C08L79/08
摘要:
A resin composition which is excellent in quick curing and can be used for curing in conventionally used ovens, and a semiconductor device which is excellent in reliability such as solder crack resistance or the like when the resin composition is used as a die attach material for semiconductor. Further preferably, a resin composition which has a sufficient low stress property, good adhesion and excellent bleeding property.
A resin composition comprising a filler (A), the compound (B) comprising a structure represented by the formula (1) and a functional group represented by the formula (2) and a thermal radical initiator (C), and substantially not containing a photo polymerization initiator.
A resin composition comprising a filler (A), the compound (B) comprising a structure represented by the formula (1) and a functional group represented by the formula (2) and a thermal radical initiator (C), and substantially not containing a photo polymerization initiator.
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