发明公开
EP2653924A2 Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method
有权
一种用于液体回收系统，该液浸曝光装置中，液浸曝光方法，以及处理用于物品的制造
- 专利标题： Liquid recovery system, immersion exposure apparatus, immersion exposure method, and device fabricating method
- 专利标题（中）： 一种用于液体回收系统，该液浸曝光装置中，液浸曝光方法，以及处理用于物品的制造
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申请号： EP13175873.2申请日： 2008-01-23
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公开(公告)号： EP2653924A2公开(公告)日： 2013-10-23
- 发明人: Nagasaka, Hiroyuki
- 申请人： Nikon Corporation
- 申请人地址： 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
- 代理机构： HOFFMANN EITLE
- 优先权： US881826P 20070123; US10162 20080122
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/52
摘要：
A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening (33); a gap portion (15)that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part (40) that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening (34) that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
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