发明公开
- 专利标题： LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUS
- 专利标题（中）： 激光器件和系统产生极UV光的激光装置
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申请号： EP11813691.0申请日： 2011-12-15
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公开(公告)号： EP2656456A2公开(公告)日： 2013-10-30
- 发明人: NOWAK, Krzysztof , WAKABAYASHI, Osamu , HOSHINO, Hideo
- 申请人： Gigaphoton Inc.
- 申请人地址： 2-6-1 Otemachi Chiyoda-ku, Tokyo 100-0004 JP
- 专利权人： Gigaphoton Inc.
- 当前专利权人： Gigaphoton Inc.
- 当前专利权人地址： 2-6-1 Otemachi Chiyoda-ku, Tokyo 100-0004 JP
- 代理机构： Hards, Andrew
- 优先权： JP2010283715 20101220; JP2011066786 20110324; JP2011190364 20110901; JP2011250333 20111116
- 国际公布： WO2012085638 20120628
- 主分类号： H01S3/23
- IPC分类号： H01S3/23 ; H01S3/00 ; H05G2/00
摘要：
A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.
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