发明公开
EP2672307A2 Projection optical system, exposure apparatus, and exposure method
审中-公开
Optisches Projektionssystem,Belichtungsvorrichtung und Belichtungsverfahren
- 专利标题: Projection optical system, exposure apparatus, and exposure method
- 专利标题(中): Optisches Projektionssystem,Belichtungsvorrichtung und Belichtungsverfahren
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申请号: EP13175504.3申请日: 2004-05-06
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公开(公告)号: EP2672307A2公开(公告)日: 2013-12-11
- 发明人: Omura, Yasuhiro
- 申请人: Nikon Corporation
- 申请人地址: 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
- 代理机构: HOFFMANN EITLE
- 优先权: JP2003128154 20030506; JP2003350647 20031009; JP2003364596 20031024
- 主分类号: G02B17/08
- IPC分类号: G02B17/08 ; H01L21/027
摘要:
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B17/00 | 有或无折射元件的具有反射面的系统 |
G02B17/08 | .折反射系统 |