发明公开
EP2672307A2 Projection optical system, exposure apparatus, and exposure method 审中-公开
Optisches Projektionssystem,Belichtungsvorrichtung und Belichtungsverfahren

  • 专利标题: Projection optical system, exposure apparatus, and exposure method
  • 专利标题(中): Optisches Projektionssystem,Belichtungsvorrichtung und Belichtungsverfahren
  • 申请号: EP13175504.3
    申请日: 2004-05-06
  • 公开(公告)号: EP2672307A2
    公开(公告)日: 2013-12-11
  • 发明人: Omura, Yasuhiro
  • 申请人: Nikon Corporation
  • 申请人地址: 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: 12-1 Yurakucho 1-chome Chiyoda-ku Tokyo100-8331 JP
  • 代理机构: HOFFMANN EITLE
  • 优先权: JP2003128154 20030506; JP2003350647 20031009; JP2003364596 20031024
  • 主分类号: G02B17/08
  • IPC分类号: G02B17/08 H01L21/027
Projection optical system, exposure apparatus, and exposure method
摘要:
A catadioptric projection optical system for forming a reduced image of a first surface (R) on a second surface (W) is a relatively compact projection optical system having excellent imaging performance as well corrected for various aberrations, such as chromatic aberration and curvature of field, and being capable of securing a large effective image-side numerical aperture while suitably suppressing reflection loss on optical surfaces. The projection optical system comprises at least two reflecting mirrors (CM1, CM2), and a boundary lens (Lb) whose surface on the first surface side has a positive refracting power, and an optical path between the boundary lens and the second surface is filled with a medium (Lm) having a refractive index larger than 1.1. Every transmitting member and every reflecting member with a refracting power forming the projection optical system are arranged along a single optical axis (AX) and the projection optical system has an effective imaging area of a predetermined shape not including the optical axis.
信息查询
0/0