A method for producing a reflective optical component (10) for an EUV projection exposure apparatus, said component having a substrate (12) having a base body (14), and a reflective layer (20) arranged on the substrate (12), wherein the substrate (12) has an optically operative microstructuring (16), comprises the following steps: working the microstructuring (16) into the substrate (12), polishing the substrate (12) after the micro-structuring (16) has been worked into the substrate (12), applying the reflective layer (20) to the substrate (12). A reflective optical component for an EUV projection exposure apparatus correspondingly has a polished surface between the microstructuring and the reflective layer.