发明公开
- 专利标题: MASK
- 专利标题(中): 面具
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申请号: EP12854234.7申请日: 2012-12-03
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公开(公告)号: EP2787387A1公开(公告)日: 2014-10-08
- 发明人: SHIN, Bu Gon
- 申请人: LG Chem, Ltd.
- 申请人地址: 128 Yeoui-daero Yeongdeungpo-gu Seoul 150-721 KR
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: 128 Yeoui-daero Yeongdeungpo-gu Seoul 150-721 KR
- 代理机构: Goddar, Heinz J.
- 优先权: KR20110127628 20111201
- 国际公布: WO2013081438 20130606
- 主分类号: G02F1/1337
- IPC分类号: G02F1/1337 ; G02F1/13
摘要:
Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By the mask, collimated light or nearly collimated light may be irradiated with uniform illumination to a surface of an object to be irradiated. Further, by the mask, light may be effectively incident even on the object to be irradiated in the curved shape.
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