发明公开
EP2787387A1 MASK 审中-公开
面具

  • 专利标题: MASK
  • 专利标题(中): 面具
  • 申请号: EP12854234.7
    申请日: 2012-12-03
  • 公开(公告)号: EP2787387A1
    公开(公告)日: 2014-10-08
  • 发明人: SHIN, Bu Gon
  • 申请人: LG Chem, Ltd.
  • 申请人地址: 128 Yeoui-daero Yeongdeungpo-gu Seoul 150-721 KR
  • 专利权人: LG Chem, Ltd.
  • 当前专利权人: LG Chem, Ltd.
  • 当前专利权人地址: 128 Yeoui-daero Yeongdeungpo-gu Seoul 150-721 KR
  • 代理机构: Goddar, Heinz J.
  • 优先权: KR20110127628 20111201
  • 国际公布: WO2013081438 20130606
  • 主分类号: G02F1/1337
  • IPC分类号: G02F1/1337 G02F1/13
MASK
摘要:
Provided are a mask, a method of manufacturing the same, a light irradiation device, a method of radiating light, and a method of manufacturing an orientationally ordered photo-alignment layer. By the mask, collimated light or nearly collimated light may be irradiated with uniform illumination to a surface of an object to be irradiated. Further, by the mask, light may be effectively incident even on the object to be irradiated in the curved shape.
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