Invention Publication
- Patent Title: MESURE PAR INTERFEROMETRIE ATOMIQUE
- Patent Title (English): Measurement by means of atom interferometry
- Patent Title (中): MEASUREMENT BY原子干涉
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Application No.: EP12816719.4Application Date: 2012-12-12
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Publication No.: EP2791620A1Publication Date: 2014-10-22
- Inventor: BIDEL, Yannick , ZAHZAM, Nassim , BRESSON, Alexandre
- Applicant: ONERA (Office National d'Etudes et de Recherches Aérospatiales)
- Applicant Address: 29, Avenue de la Division-Leclerc 92320 Châtillon FR
- Assignee: ONERA (Office National d'Etudes et de Recherches Aérospatiales)
- Current Assignee: ONERA (Office National d'Etudes et de Recherches Aérospatiales)
- Current Assignee Address: 29, Avenue de la Division-Leclerc 92320 Châtillon FR
- Agency: Cabinet Plasseraud
- Priority: FR1161777 20111216
- International Announcement: WO2013088064 20130620
- Main IPC: G01C19/58
- IPC: G01C19/58 ; G01V7/00 ; G01P15/00 ; G21K1/00
Abstract:
The invention relates to a measurement by means of atom interferometry, using a Raman source that is created by modulating a monochromatic laser source. By conveniently selecting positions (P
0 , P
1 , P
2 ) in which interactions between atoms and a laser radiation, produced by the Raman source, are caused, it is possible to eliminate or at least reduce a measurement bias caused by supplementary components of the laser radiation. Such a measurement having eliminated or reduced bias can be used in an inertia sensor.
0 , P
1 , P
2 ) in which interactions between atoms and a laser radiation, produced by the Raman source, are caused, it is possible to eliminate or at least reduce a measurement bias caused by supplementary components of the laser radiation. Such a measurement having eliminated or reduced bias can be used in an inertia sensor.
Public/Granted literature
- EP2791620B1 MESURE PAR INTERFEROMETRIE ATOMIQUE Public/Granted day:2015-10-28
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