发明公开
EP2852650A4 CMP COMPOSITION CONTAINING ZIRCONIA PARTICLES AND METHOD OF USE
审中-公开
CMP组合物和使用氧化锆粒子的制造方法
- 专利标题： CMP COMPOSITION CONTAINING ZIRCONIA PARTICLES AND METHOD OF USE
- 专利标题（中）： CMP组合物和使用氧化锆粒子的制造方法
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申请号： EP13793438申请日： 2013-05-21
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公开(公告)号： EP2852650A4公开(公告)日： 2016-02-24
- 发明人: JIN WIECHANG , PARKER JOHN , REMSEN ELIZABETH
- 申请人： CABOT MICROELECTRONICS CORP
- 专利权人： CABOT MICROELECTRONICS CORP
- 当前专利权人： CABOT MICROELECTRONICS CORP
- 优先权： US201213477535 2012-05-22
- 主分类号： C09K3/14
- IPC分类号： C09K3/14 ; C09G1/02 ; C23F3/06 ; H01L21/3105 ; H01L21/321
摘要：
The invention provides a chemical-mechanical polishing composition containing zirconia particles, a modifying agent that adheres to the zirconia particles, an organic acid, and water, as well as a method of using such a polishing composition to polish substrates and a method of using a polishing composition comprising zirconia particles, an organic acid, an oxidizing agent, and water to polishing substrates containing metal and oxide-based dielectric materials.
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