发明公开
- 专利标题： SUBSTRATE FILM AND SINTERING METHOD
- 专利标题（中）： 基材膜和烧结工艺
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申请号： EP13799914.0申请日： 2013-05-31
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公开(公告)号： EP2855148A1公开(公告)日： 2015-04-08
- 发明人: SCHRODER, Kurt, A. , UCHIDA, Hiroshi , SHINOZAKI, Kenji
- 申请人： Showa Denko K.K.
- 申请人地址： 13-9 Shibadaimon 1-chome Minato-ku Tokyo 105-8518 JP
- 专利权人： Showa Denko K.K.
- 当前专利权人： Showa Denko K.K.
- 当前专利权人地址： 13-9 Shibadaimon 1-chome Minato-ku Tokyo 105-8518 JP
- 代理机构： Strehl Schübel-Hopf & Partner
- 优先权： US201261655644P 20120605
- 国际公布： WO2013182896 20131212
- 主分类号： B32B27/00
- IPC分类号： B32B27/00 ; B32B27/36 ; G03G13/00
摘要：
A coating layer 12 is formed on a base film 10 by heat resistant resin having a Tg (glass transition temperature) of 120° C. or more, and more preferably 200° C. or more, and a functional thin film 14 is produced by printing ink composite including conductive particles on a surface of the coating layer 12 and thereby forming an ink layer. This functional thin film 14 is sintered by heating performed by photo irradiation, and a conductive layer is formed thereby.
公开/授权文献
- EP2855148B1 SUBSTRATE FILM AND SINTERING METHOD 公开/授权日：2019-04-10
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