发明公开
- 专利标题: COSMETIC METHOD
- 专利标题(中): 化妆品程序
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申请号: EP13844980申请日: 2013-10-11
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公开(公告)号: EP2907501A4公开(公告)日: 2016-04-20
- 发明人: KIMURA TOMOKO , KANNO NAOMI , YAMAKI SATOSHI
- 申请人: SHISEIDO CO LTD
- 专利权人: SHISEIDO CO LTD
- 当前专利权人: SHISEIDO CO LTD
- 优先权: JP2012227076 2012-10-12
- 主分类号: A61K8/85
- IPC分类号: A61K8/85 ; A45D40/30 ; A61K8/02 ; A61K8/73 ; A61K8/87 ; A61Q1/10 ; A61Q17/04
摘要:
The present invention provides a cosmetic method having an excellent secondary adhesion resistance effect. The cosmetic method of the present invention has a step of applying a cosmetic material on the skin, a step of pasting the base material film surface of a thin film on the skin, and a step of removing the support body of the pasted thin film, wherein the thin film consists of a base material film of the thickness of 10 to 500 nm and a support body.
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