发明公开
EP2988935A1 TIE-LAYER ADHESIVES FOR STYRENIC MULTI-LAYER STRUCTURES 审中-公开
BINDESCHICHTKLEBSTOFFEFÜRSTYROLHALTIGE MEHRSCHICHTIGE STRUKTUREN

  • 专利标题: TIE-LAYER ADHESIVES FOR STYRENIC MULTI-LAYER STRUCTURES
  • 专利标题(中): BINDESCHICHTKLEBSTOFFEFÜRSTYROLHALTIGE MEHRSCHICHTIGE STRUKTUREN
  • 申请号: EP14788158.5
    申请日: 2014-04-24
  • 公开(公告)号: EP2988935A1
    公开(公告)日: 2016-03-02
  • 发明人: BOTROS, Maged, G.
  • 申请人: Equistar Chemicals LP
  • 申请人地址: 1221 Mckinney Suite 700 Lyondellbasell Tower Houston, TX 77010 US
  • 专利权人: Equistar Chemicals LP
  • 当前专利权人: Equistar Chemicals LP
  • 当前专利权人地址: 1221 Mckinney Suite 700 Lyondellbasell Tower Houston, TX 77010 US
  • 代理机构: Sacco, Marco
  • 优先权: US201361815811P 20130425
  • 国际公布: WO2014176433 20141030
  • 主分类号: B32B27/32
  • IPC分类号: B32B27/32 B32B27/06
TIE-LAYER ADHESIVES FOR STYRENIC MULTI-LAYER STRUCTURES
摘要:
A multilayer structure and a method for forming a multilayer structure, the multilayer structure includes: (A) a first polyolefin layer; (B) a styrene polymer layer; (C) a second polyolefin layer; and (D) at least one tie-layer comprising a tie-layer composition. The tie-layer composition includes: (1) 25 to 75 wt. %, based upon the total weight of the tie-layer composition, of a first copolymer, wherein the first copolymer comprises ethylene derived units and units derived from a C4-8 α-olefin; (2) 5 to 25 wt. %, based upon the total weight of the tie-layer composition, of a polyethylene resin grafted with an ethylenically unsaturated carboxylic acid or acid derivative; (3) 20 to 50 wt. %, based upon the total weight of the tie-layer composition, of a triblock copolymer composition; and (4) optionally, 0.001 to 20 wt. %, based upon the total weight of the tie-layer composition, of a low density polyethylene.
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