发明授权
- 专利标题: METHOD FOR MANUFACTURING A DYE SCAVENGING SUBSTRATE
- 专利标题(中): 制造染料清除基质的方法
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申请号: EP14720624.7申请日: 2014-05-01
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公开(公告)号: EP3036314B1公开(公告)日: 2017-08-30
- 发明人: MCNAMEE, Patrick , LE GUERLÉDAN, Lauriane
- 申请人: Henkel AG & Co. KGaA
- 申请人地址: Henkelstrasse 67 40589 Düsseldorf DE
- 专利权人: Henkel AG & Co. KGaA
- 当前专利权人: Henkel AG & Co. KGaA
- 当前专利权人地址: Henkelstrasse 67 40589 Düsseldorf DE
- 代理机构: Strohe-Kamp, Geertje
- 优先权: GB201314895 20130820
- 国际公布: WO2015024677 20150226
- 主分类号: C11D3/00
- IPC分类号: C11D3/00 ; D06P3/66 ; C11D17/04 ; D06M13/385 ; D06M13/463 ; D06M13/525 ; D06M23/00 ; C11D3/30 ; D06P5/22 ; D06M13/11 ; D06M13/47 ; D06M101/06
摘要:
A method for manufacturing a dye scavenging substrate which comprises the steps of: (a) providing an absorbent substrate; (b) passing the substrate through a bath containing an alkaline solution of a dye scavenging compound selected from: (i) a N-trisubstituted ammonium-2-hydroxy-3-halopropyl compound having the general formula (I), or (ii) a salt of epoxy propyl ammonium having the general formula (II), or a combination thereof; (c) subjecting the substrate to a pressure of from about 0.04 MPa to about 0.40 MPa; (d) wrapping the substrate in a water impermeable material and rotating the substrate for a period of from about 12 hours to about 60 hours; (e) removing the water impermeable material and passing the substrate through a bath containing an acid solution; (f) subjecting the substrate to a pressure of from about 0.15 MPa to about 0.40 MPa; and (g) drying the substrate.
公开/授权文献
- EP3036314A1 METHOD FOR MANUFACTURING A DYE SCAVENGING SUBSTRATE 公开/授权日:2016-06-29
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