发明公开
EP3106537A4 METHOD AND DEVICE FOR CONTROLLING AMOUNT OF HOT DIP GALVANIZATION ADHESION
审中-公开
VERFAHREN UND VORRICHTUNG ZUR KONTROLLE DES AUSMASSES EINER FEUERVERZINKUNGSHAFTUNG
- 专利标题: METHOD AND DEVICE FOR CONTROLLING AMOUNT OF HOT DIP GALVANIZATION ADHESION
- 专利标题(中): VERFAHREN UND VORRICHTUNG ZUR KONTROLLE DES AUSMASSES EINER FEUERVERZINKUNGSHAFTUNG
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申请号: EP15746290申请日: 2015-02-10
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公开(公告)号: EP3106537A4公开(公告)日: 2017-08-30
- 发明人: SUEMORI HIDEAKI , TANAKA MASAYOSHI , KAKEMIZU NORIKATSU , YAMAMOTO TAKASHI , MORISHITA HISAO , YAMASHITA RYUUICHI
- 申请人: PRIMETALS TECH JAPAN LTD , NISSHIN STEEL CO LTD
- 专利权人: PRIMETALS TECH JAPAN LTD,NISSHIN STEEL CO LTD
- 当前专利权人: PRIMETALS TECH JAPAN LTD,NISSHIN STEEL CO LTD
- 优先权: JP2014023019 2014-02-10
- 主分类号: C23C2/20
- IPC分类号: C23C2/20 ; C23C2/00 ; C23C2/14 ; C23C2/16
摘要:
The present invention is provided with: a duct of which one end interconnects to a wiping nozzle (22, 23) and the other end is open; a first valve (17) that controls the actual gas pressure (P1') of the wiping nozzle (22, 23); a second valve (18) that controls the gas flow rate (Q2) dissipating to outside the system from another branched duct; a wiping pressure setting unit (11) that sets the set gas pressure (P1) of the wiping nozzle (22, 23) ; a first valve aperture setter (13) that sets the valve aperture of the first valve (17) ; a second valve aperture setter (14) that sets the valve aperture of the second valve (18); and a computation processing unit (12) that presents to the first valve aperture setter (13) the valve aperture at which the gas pressure (P1') matches a set gas pressure (PI), and presents to the second valve aperture setter (14) the valve aperture at which the total gas flow rate (QT) supplied from a gas supply device (15) becomes uniform.
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IPC分类: