发明公开
EP3119922A1 CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE 审中-公开
分离装置用清洁气的进样到分离装置清洁

  • 专利标题: CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE
  • 专利标题(中): 分离装置用清洁气的进样到分离装置清洁
  • 申请号: EP15765627.3
    申请日: 2015-03-11
  • 公开(公告)号: EP3119922A1
    公开(公告)日: 2017-01-25
  • 发明人: LEE, Sang InPAK, Samuel S.LEE, Daniel HoYANG, Hyoseok Daniel
  • 申请人: Veeco ALD Inc.
  • 申请人地址: 3191 Laurelview Court Fremont, CA 94538 US
  • 专利权人: Veeco ALD Inc.
  • 当前专利权人: Veeco ALD Inc.
  • 当前专利权人地址: 3191 Laurelview Court Fremont, CA 94538 US
  • 代理机构: Boult Wade Tennant
  • 优先权: US201461953742P 20140315; US201461953876P 20140316
  • 国际公布: WO2015142589 20150924
  • 主分类号: C23C16/455
  • IPC分类号: C23C16/455
CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE
摘要:
Embodiments relate to a deposition device that operates in two modes: a deposition mode, and a cleaning mode. In the deposition mode, modular injectors inject materials onto a substrate to form a layer. In the cleaning mode, the deposition device is cleaned without disassembly by injecting a cleaning gas. The injector module assembly may be cleaned in the cleaning mode by injecting cleaning gas through an exhaust for removing reactant precursor and routing the cleaning gas from the exhaust to another exhaust for removing source precursor. Alternatively, the injector module assembly is cleaned by injecting cleaning gas into a passage between an injector for injecting a source precursor and another injector for injecting a reactant precursor, and routing the cleaning gas to one of the exhausts in the cleaning mode.
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