发明公开
- 专利标题： AN UNDULATOR
- 专利标题（中）： 波荡
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申请号： EP15712652.5申请日： 2015-03-30
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公开(公告)号： EP3126910A1公开(公告)日： 2017-02-08
- 发明人: NIKIPELOV, Andrey, Alexandrovich , AKKERMANS, Johannes, Antonius, Gerardus , GRIMMINCK, Leonardus, Adrianus, Gerardus , LOOPSTRA, Erik, Roelof , RENKENS, Michael, Jozef, Mathijs , TOMA, Adrian , NIENHUYS, Han-Kwang
- 申请人： ASML Netherlands B.V.
- 申请人地址： P.O. Box 324 5500 AH Veldhoven NL
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： P.O. Box 324 5500 AH Veldhoven NL
- 代理机构： Slenders, Petrus J. W.
- 优先权： EP14162828 20140331
- 国际公布： WO2015150315 20151008
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; F17C3/08 ; F25D19/00 ; H01F1/055 ; H01F6/04 ; H01F7/02 ; H01S3/09 ; H05H7/04
摘要：
An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
公开/授权文献
- EP3126910B1 UNDULATOR, FREE ELECTRON LASER AND LITHOGRAPHIC SYSTEM 公开/授权日：2019-05-15
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