发明公开
EP3130459A1 GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
审中-公开
维多利亚州ZER HERSTELLUNG DAVON的GASBARRIENENLAMINATFILM
- 专利标题: GAS BARRIER FILM AND METHOD FOR PRODUCING SAME
- 专利标题(中): 维多利亚州ZER HERSTELLUNG DAVON的GASBARRIENENLAMINATFILM
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申请号: EP15772887.4申请日: 2015-03-27
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公开(公告)号: EP3130459A1公开(公告)日: 2017-02-15
- 发明人: SUZUKI, Azusa , IWAHASHI, Hiroyuki , NISHIZONO, Takeshi , MATSUI, Shigeki , HARAGUCHI, Kazutoshi
- 申请人: Dai Nippon Printing Co., Ltd.
- 申请人地址: 1-1, Ichigaya-kaga-cho 1-chome Shinjuku-ku Tokyo 162-8001 JP
- 专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人: Dai Nippon Printing Co., Ltd.
- 当前专利权人地址: 1-1, Ichigaya-kaga-cho 1-chome Shinjuku-ku Tokyo 162-8001 JP
- 代理机构: Jacobi, Markus Alexander
- 优先权: JP2014073309 20140331; JP2014073310 20140331
- 国际公布: WO2015152069 20151008
- 主分类号: B32B9/00
- IPC分类号: B32B9/00 ; B65D65/02 ; C08J7/04
摘要:
The invention provides a gas barrier film with low deterioration in the gas barrier property before and after high-temperature hot water treatment. The gas barrier film has a gas barrier coating film, formed as a composite film comprising a network structure having a mesh structure with Si-O-Si bonds as the basic lattice and a water-soluble polymer crystallized as microcrystals, incorporated into the mesh of the network structure, wherein a barrier coating agent, obtained by mixing a condensate solution of an alkoxysilane hydrolysate prepared as a mixed solution in which the proportion of bonded states of the silicon atoms of the condensate with Q1 and Q2 structures is at least 60% of the total silicon atoms, with a crystalline water-soluble polymer, is coated on a base material film, either after forming or without forming an aluminum oxide vapor deposition film, to form a coating layer.
公开/授权文献
- EP3130459B1 GAS BARRIER FILM AND METHOD FOR PRODUCING SAME 公开/授权日:2021-05-05
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