- 专利标题: FABRICATION OF LOW DEFECTIVITY ELECTROCHROMIC DEVICES
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申请号: EP15785891申请日: 2015-04-28
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公开(公告)号: EP3137942A4公开(公告)日: 2018-01-03
- 发明人: PRADHAN ANSHU A , ROZBICKI ROBERT T , GILLASPIE DANE , KAILASAM SRIDHAR K
- 申请人: VIEW INC
- 专利权人: VIEW INC
- 当前专利权人: VIEW INC
- 优先权: US201461988111 2014-05-02
- 主分类号: G02F1/15
- IPC分类号: G02F1/15 ; C03C17/34 ; C23C14/56
摘要:
Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition. In certain embodiments, the device includes a counter electrode having an anodically coloring electrochromic material in combination with an additive.
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