发明公开
EP3230489A1 ORGANIC VAPOR PHASE DEPOSITION SYSTEM AND METHODS OF USE FOR SIMULTANEOUS DEPOSITION OF LOW AND HIGH EVAPORATION TEMPERATURE MATERIALS, AND DEVICES PRODUCED THEREIN
审中-公开
有机蒸气相沉积系统和用于低和高蒸发温度材料的同时沉积的方法以及其中生产的器件
- 专利标题： ORGANIC VAPOR PHASE DEPOSITION SYSTEM AND METHODS OF USE FOR SIMULTANEOUS DEPOSITION OF LOW AND HIGH EVAPORATION TEMPERATURE MATERIALS, AND DEVICES PRODUCED THEREIN
- 专利标题（中）： 有机蒸气相沉积系统和用于低和高蒸发温度材料的同时沉积的方法以及其中生产的器件
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申请号： EP15823861.8申请日： 2015-12-11
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公开(公告)号： EP3230489A1公开(公告)日： 2017-10-18
- 发明人: FORREST, Stephen, R. , SONG, Byeongseop
- 申请人： The Regents Of The University Of Michigan
- 申请人地址： Office of Technology Transfer 1600 Huron Parkway 2nd Floor Ann Arbor, Michigan 48109 US
- 专利权人： The Regents Of The University Of Michigan
- 当前专利权人： The Regents Of The University Of Michigan
- 当前专利权人地址： Office of Technology Transfer 1600 Huron Parkway 2nd Floor Ann Arbor, Michigan 48109 US
- 代理机构： Finnegan Europe LLP
- 优先权： US201462090665P 20141211
- 国际公布： WO2016094755 20160616
- 主分类号： C23C14/12
- IPC分类号： C23C14/12 ; C23C14/22 ; C23C14/24 ; H01L51/00
摘要：
An organic vapor phase deposition system is provided. The system may include a main reactor defined by a main reactor wail, at least two source barrels configured to introduce at least two organic vapors into the main reactor, and a substrate stage positioned in the main reactor and at least one carrier gas injection line configured to distribute a carrier gas along the main reactor wall, which reduces condensation of the organic vapors onto the main reactor wall as the organic vapors flow toward the substrate stage. A method of fabricating an organic film using organic vapor phase deposition is also provided.
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