发明公开
EP3236499A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
审中-公开
阵列基板及其制造方法和显示装置
- 专利标题: ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREFOR, AND DISPLAY DEVICE
- 专利标题(中): 阵列基板及其制造方法和显示装置
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申请号: EP15869148.5申请日: 2015-11-17
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公开(公告)号: EP3236499A1公开(公告)日: 2017-10-25
- 发明人: ZHANG, Li , YAN, Liangchen , CHEN, Jiangbo
- 申请人: BOE Technology Group Co., Ltd.
- 申请人地址: No. 10 Jiuxianqiao Rd. Chaoyang District Beijing 100015 CN
- 专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.
- 当前专利权人地址: No. 10 Jiuxianqiao Rd. Chaoyang District Beijing 100015 CN
- 代理机构: Cohausz & Florack
- 优先权: CN201410796484 20141218
- 国际公布: WO2016095639 20160623
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; H01L21/77
摘要:
The present invention provides an array substrate and a manufacturing method thereof, and a display apparatus. The array substrate comprises a gate layer, a gate insulating layer, an active layer, a source and drain layer, a scanning line and a signal line formed on a substrate, the signal line is provided in a same layer as the gate layer, the scanning line is provided in a same layer as the source and drain layer, the gate insulating layer is provided between the gate layer, the signal line and the active layer. The array substrate further comprises a first through hole and a second through hole penetrating through the gate insulating layer, the signal line is connected to the source and drain layer via the first through hole, and the scanning line is connected to the gate layer via the second through hole. The present invention can increase a thickness of a power supply line without causing too much influence on formation processes of other structures, thus an influence of IR drop is suppressed.
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