- 专利标题: ULTRALOW EXPANSION TITANIA-SILICA GLASS
-
申请号: EP16708813.7申请日: 2016-02-10
-
公开(公告)号: EP3256429A1公开(公告)日: 2017-12-20
- 发明人: ANNAMALAI, Sezhian , DURAN, Carlos Alberto , HRDINA, Kenneth Edward , ROSCH, William Rogers
- 申请人: Corning Incorporated
- 申请人地址: 1 Riverfront Plaza Corning, New York 14831 US
- 专利权人: Corning Incorporated
- 当前专利权人: Corning Incorporated
- 当前专利权人地址: 1 Riverfront Plaza Corning, New York 14831 US
- 代理机构: Scheuermann, Erik
- 优先权: US201562115767P 20150213
- 国际公布: WO2016130604 20160818
- 主分类号: C03C23/00
- IPC分类号: C03C23/00 ; C03C4/00 ; C03C3/076 ; C03C3/089 ; C03C3/115
摘要:
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.
信息查询