- 专利标题： LIQUID RECOVERY SYSTEM, IMMERSION EXPOSURE APPARATUS, IMMERSION EXPOSING METHOD, AND DEVICE FABRICATING METHOD
-
申请号： EP18163585.5申请日： 2008-01-23
-
公开(公告)号： EP3407137A1公开(公告)日： 2018-11-28
- 发明人: Nagasaka, Hiroyuki
- 申请人： Nikon Corporation
- 申请人地址： 15-3, Konan 2-chome, Minato-ku, Tokyo 108-6290 JP
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： 15-3, Konan 2-chome, Minato-ku, Tokyo 108-6290 JP
- 代理机构： Hoffmann Eitle
- 优先权： US88182607P 20070123; US1016208 20080122
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/52
摘要：
A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
信息查询
IPC分类:
