AN ANTIMICROBIAL COMPOSITION
摘要:
The present invention relates to an antimicrobial composition and more particularly to an antimicrobial composition at the pH of skin. Accordingly, the present invention provides an antimicrobial composition comprising: (a) 5 to 40% by weight of an ammonium salt having at least one covalently bonded hydrogen attached to the nitrogen or of an anionic surfactant with ammonium group as counter ion or mixtures thereof; and, (b) 0.1 to 20% by weight of a carboxylic acid with pKa value greater than 4.5.
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