- 专利标题: LASER-ETCHED GRAIN-ORIENTED SILICON STEEL RESISTANT TO STRESS RELIEF/ANNEALING AND MANUFACTURING METHOD THEREFOR
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申请号: EP18774249.9申请日: 2018-01-24
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公开(公告)号: EP3604565A1公开(公告)日: 2020-02-05
- 发明人: ZHAO, Zipeng , LI, Guobao , YANG, Yongjie , WU, Meihong , MA, Changsong , JI, Yaming , LING, Chen , XIE, Weiyong , GUO, Jianguo
- 申请人: Baoshan Iron & Steel Co., Ltd.
- 申请人地址: No.885 Fujin Road Baoshan District Shanghai 201900 CN
- 专利权人: Baoshan Iron & Steel Co., Ltd.
- 当前专利权人: Baoshan Iron & Steel Co., Ltd.
- 当前专利权人地址: No.885 Fujin Road Baoshan District Shanghai 201900 CN
- 代理机构: Zumstein, Angela
- 优先权: CN201710187566 20170327
- 国际公布: WO2018177007 20181004
- 主分类号: C21D8/12
- IPC分类号: C21D8/12
摘要:
A laser-scribed grain-oriented silicon steel resistant to stress-relief annealing and a manufacturing method therefor. Parallel linear grooves (20) are formed on one or both sides of grain-oriented silicon steel (10) by laser etching. The linear grooves (20) are perpendicular to, or at an angle to, the rolling direction of the steel plate. A maximum height of edge protrusions of the linear grooves (20) does not exceed 5 µm, and a maximum height of spatters in etch-free regions between adjacent linear grooves (20) does not exceed 5 µm, and the proportion of an area occupied by spatters in the vicinity of the linear grooves (20) does not exceed 5%. The steel has low manufacturing costs, and the etching effect of the finished steel is retained during a stress-relief annealing process. The steel is suitable for manufacturing of wound iron core transformers.
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