发明公开
- 专利标题： DYNAMIC MONITORING AND SECURING OF FACTORY PROCESSES, EQUIPMENT AND AUTOMATED SYSTEMS
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申请号： EP20156940.7申请日： 2020-02-12
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公开(公告)号： EP3839782A1公开(公告)日： 2021-06-23
- 发明人: PUTMAN, Matthew C. , PUTMAN, John B. , PINSKIY, Vadim , LIMOGE, Damas , SUNDSTROM, Andrew , WILLIAMS III, James
- 申请人： Nanotronics Imaging, Inc.
- 申请人地址： US Cuyahoga Falls, Ohio 44223 2251 Front Street Suite 110 P.O. Box 306
- 代理机构： MERH-IP Matias Erny Reichl Hoffmann Patentanwälte PartG mbB
- 优先权： US201962950588 P 20191219
- 主分类号： G06F21/55
- IPC分类号： G06F21/55 ; G05B23/02 ; H04L29/06 ; G05B19/418 ; G06F17/18 ; G06F21/56 ; H04L29/08
摘要：
A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.
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