The present invention relates to an installation for depositing nanostructures on a receptor substrate SR, comprising a chamber C, vacuum generating means in the chamber C, one or more receptor substrates SR arranged in the chamber C, and a precursor target T arranged in the chamber C provided with a substrate S and at least one layer 1 of material to be deposited on the receptor substrates SR arranged on the substrate S of the target T, so that an interface IS1 is defined between the substrate S of the target T and the layer 1 of material to be deposited, comprising heating means for heating the substrate S of the target T, the heating means being configured to heat at least the interface IS1 between the substrate S and the layer 1 to the boiling temperature Teb1 of the material of the substrate, so that the vapour of the material of the substrate S generated on the interface IS1 causes the entrainment of nanostructures of the layer 1 intended to be deposited on the receptor substrate(s).