The present invention refers to an electroplating composition for depositing a chromium or chromium alloy layer on a substrate, said composition comprising (i) trivalent chromium ions, (ii) at least one complexing agent for the trivalent chromium ions, and (iii) at least one kind of oxide-hydroxide particles; a method for depositing a respective chromium and chromium alloy layer; a respective use of said particles; and respective substrates comprising such a chromium or chromium alloy layer.