- 专利标题: RESIN MATERIAL INCLUDING SILOXANE-BOND-CONTAINING POLYMER HAVING HOST GROUP AND/OR GUEST GROUP
-
申请号: EP21759825.9申请日: 2021-02-25
-
公开(公告)号: EP4112672A1公开(公告)日: 2023-01-04
- 发明人: MATSUKURA, Toshihiko , OGUCHI, Nozomi , TAKASHIMA, Yoshinori , HARADA, Akira , OSAKI, Motofumi
- 申请人: Shiseido Company, Ltd. , OSAKA UNIVERSITY
- 申请人地址: JP Chuo-ku Tokyo 104-0061 5-5, Ginza 7-chome; JP Suita-shi Osaka 565-0871 1-1, Yamadaoka
- 代理机构: Cabinet Beau de Loménie
- 优先权: JP2020029737 20200225
- 国际公布: WO2021172468 20210902
- 主分类号: C08G77/388
- IPC分类号: C08G77/388 ; C08G77/42 ; C08L83/06
摘要:
An object of the present invention is to provide a resin material which contains a polymer compound having a host group and/or guest group and exhibits excellent solubility. The present invention relates to a resin material comprising a host body consisting of a polymer compound having a host group and a guest body consisting of a polymer compound having a guest group, or a host-guest body consisting of a polymer compound having a host group and a guest group, wherein, at least one of the polymer compound having the host group or the polymer compound having the guest group, or the polymer compound having the host group and the guest group, has a siloxane bond.
信息查询