发明公开
- 专利标题： CHLOROPRENE BLOCK COPOLYMER, LATEX, LATEX COMPOSITION, AND RUBBER COMPOSITION
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申请号： EP21775310.2申请日： 2021-03-22
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公开(公告)号： EP4130078A1公开(公告)日： 2023-02-08
- 发明人: KUMAGAI, Yushi , NISHINO, Wataru , SAITO, Yutaka , KOBAYASHI, Naoki
- 申请人： Denka Company Limited
- 申请人地址： JP Tokyo 103-8338 1-1 Nihonbashi-Muromachi 2-chome Chuo-ku
- 代理机构： Gulde & Partner
- 优先权： JP2020056386 20200326
- 国际公布： WO2021193560 20210930
- 主分类号： C08F293/00
- IPC分类号： C08F293/00 ; C08L53/02
摘要：
The present invention provides a chloroprene-based block copolymer, a latex, a latex composition, and a rubber composition that can produce a product with excellent flexibility and tensile properties without the use of a vulcanizing agent or a vulcanizing accelerator.
A chloroprene-based block copolymer, comprising 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein:
the polymer block (A) is derived from a monomer;
when the monomer is polymerized alone, a polymer with a glass transition temperature of 80°C or higher can be obtained;
the chloroprene-based polymer block (B) includes a chloroprene monomer; and
the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.
A chloroprene-based block copolymer, comprising 5 to 30% by mass of a polymer block (A) and 70 to 95% by mass of a chloroprene-based polymer block (B), wherein:
the polymer block (A) is derived from a monomer;
when the monomer is polymerized alone, a polymer with a glass transition temperature of 80°C or higher can be obtained;
the chloroprene-based polymer block (B) includes a chloroprene monomer; and
the chloroprene-based block copolymer has a toluene insoluble content of 20 to 100% by mass with respect to 100% by mass of the chloroprene-based block copolymer.
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