- 专利标题: RESIN COMPOSITION FOR STEREOLITHOGRAPHY
-
申请号: EP21877611.0申请日: 2021-10-05
-
公开(公告)号: EP4227330A1公开(公告)日: 2023-08-16
- 发明人: ARIGA Youhei , NISHIZAWA Shigetoshi
- 申请人: DIC Corporation
- 申请人地址: JP Tokyo 174-8520 35-58, Sakashita 3-chome Itabashi-ku
- 代理机构: TBK
- 优先权: JP2020170363 20201008
- 国际公布: WO2022075312 20220414
- 主分类号: C08F20/20
- IPC分类号: C08F20/20 ; C08F2/44 ; C08F2/50 ; B33Y80/00 ; B29C64/165 ; B29C64/264 ; C08K3/013 ; B33Y70/10
摘要:
An object of the present invention is to provide a resin composition for stereolithography that can reduce generation of color unevenness and provide excellent formability. The present invention has achieved this object by providing a resin composition for stereolithography including an ultraviolet curable resin (A) and an inorganic pigment (B) that are blended, in which the inorganic pigment (B) has a specific gravity of 2.0 ≤ ρ and a particle size distribution of a particle diameter of D50 ≤ 5 µm and D90 ≤ 20 um, and a viscosity of the resin composition for stereolithography at 25°C is 100 Pa·s or more.
信息查询
IPC分类: