APPARATUS AND METHOD FOR PROVIDING ULTRAPURE WATER
摘要:
The invention relates to an apparatus for providing ultrapure water, in particular ultrapure water for use in semiconductor fabrication.
This apparatus comprises at least one cylindrical reactor with an inner cylindrical shell, an outer cylindrical shell and a channel-like volume between inner shell and outer shell.
According to the invention
- said inner cylindrical shell houses at least one UV emission device,
- said outer cylindrical shell comprises at least one means for reflecting UV radiation, and
- said channel-like volume is provided for flowing water through the reactor.
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